How to improve your yield for LIPSS generation and engraving applications?
Please join us on
Thursday, May 28, 2020 at 10am CEST
Title: Micro-processing yield improvement with MPLC-based beam shaping
Duration: 1 hour
Webinar content
Introduction to micro-processing challenges to be addressed with beam-shaping
– presented by John Lopez, CNRS - CELIA laboratory
High quality beam shaping with Multi-Plane Light Conversion including beam splitting and line top-hat generation
– presented by Cailabs
Yield improvement on engraving application within an industrial femtosecond machine thanks to a 1x9 beam splitting
– presented by LASEA
Yield improvement on Laser Induced Periodic Surface Structure (LIPSS) generation application thanks to a Line Top-Hat of 1/20 aspect ratio
– presented by ALPhANOV
>> Register now
